The tool has successfully passed acceptance tests and is ready for processing. It offers high-quality deposition of SiO2 and SiNx with excellent thickness uniformity over 200 mm wafer size and stable performance. Users can tune key film properties such as refractive index, stress, and stoichiometry. There is also the option to run ammonia-free nitride recipes, which can help reduce film stress, improve optical characteristics, and fine-tune stoichiometry.

For samples smaller than an 8" wafer carrier, secure the sample to the carrier using small pieces of Kapton tape on the wafer carrier dedicated to either SiO2 or SiN? depositions.

Do not use any paste, grease, oil, or other adhesive materials to fix the sample, as these can outgas during processing and contaminate the chamber.

An alternative solution is to use recessed wafer carriers, which will soon be available for routine use.

After completing your deposition, record the following information in the logbook located next to the tool:

• Recipe name
• Substrate material(s)
• Process time
• Deposition type (SiO2 or SiN?)
• Any relevant process parameters or observations
• Your name and date of use

Accurate logbook records are essential for process traceability, troubleshooting, and chamber maintenance.

 

We also have access to a large library of qualified SPTS recipes, which will support a wide range of process needs.