Picture of ALD system - Savannah-100
Current status:
AVAILABLE
Book | Log| 
Show/Collapse all

Responsibles
1st Responsible:
Harald Havir
Process:
Anders Kvennefors
Files
You must be logged in to view files.
Description

Atomic Layer Deposition system from Cambridge Nanotech. Deposition of AlOx and HfO high-k dielectric. Installed in room Q255

Available Precursors: TMAl, TDMAHf, TTBSi, DEZn

Details
Tool name:
ALD system - Savannah-100
Area/room:
Q255: LEO SEM
Category:
CVD equipment
Manufacturer:
Cambridge Nanotech
Model:
Savannah 100
Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
You must be logged in to view tool modes.